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      Photoresists are photosensitive resins that are used in the lithography process to transfer circuit patterns, such as those for semiconductors, on a silicone wafer. They form circuit patterns on the surface of a silicone wafer with photochemical reaction caused by light irradiation through a photomask on which the circuit patterns are drawn. Shin-Etsu photoresists support advanced lithography using the light source from i-line, KrF, ArF to EUV. We also provide spin-on middle/under-layer hardmasks used in the nanofabrication process.

      Series Name

      • SIPR series, SEPR series, SAIL series, SEVR series, SHB series, ODL series

      Applications

      • Semiconductor manufacturing process
      • Magnetic head manufacturing process
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      For Inquiries About This Product
      • Company:
        Shin-Etsu Chemical Co., Ltd.
      • Department:
        New Functional Materials Div. New Functional Materials Dept. Ⅰ
      • Phone:
        +81-3-3246-5346
      
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